Applicability of step-coverage modeling to TiO2thin films in atomic layer deposition

Journal of the Electrochemical Society

Volumn 154, Issue 12, 2007, Pages

  Kim, Ja Yong ^a   Kim, Jin Hyock ^b   Ahn, Ji Hoon ^a   Park, Pan Kwi ^a   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; FILM THICKNESS; NONLINEAR ANALYSIS; PARAMETER ESTIMATION; PROBABILITY; THIN FILMS;

DEPOSITION TEMPERATURE; MODEL PREDICTIONS; NONLINEAR DEPENDENCE;

TITANIUM OXIDES;

EID: 35548962382     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2789802     Document Type: Article

References (18)

1. S. M. Rossnagel and H. Kim, in Proceedings of the IEEE 2001 International Interconnect Technology Conference, p. 3, IEEE (2001).
2. H. Kim, J. Vac. Sci. Technol. B, 21, 2231 (2003).
3. M. Ritala and M., Leskala, in Handbook of Thin Film Materials, H. S. Nalwa, Editor, Vol. 1, pp. 103-159, Academic Press, San Diego, CA (2002).
4. M. Leskala and M. Ritala, Angew. Chem., Int. Ed., 42, 5548 (2003).
5. T. Seidel, A. Londergan, J. Winkler, X. Liu, and S. Ramanathan, Solid State Technol., 46, 67 (2003).
6. A. Hand, Semicond. Int., 26, 46 (2003).
7. International Technology Roadmap for Semiconductors, Semiconductor Industry Association, San Jose, CA (2005).
8. J. Y. Kim, J. H. Kim, J. H. Ahn, and S. W. Kang, J. Appl. Phys., 101, 073502 (2007).
9. R. G. Gordon, D. Hausmann, E. Kim, and J. Shepard, Chem. Vap. Deposition, 9, 73 (2003).
10. T. S. Cale, G. B. Raupp, and T. H. Gandy, J. Appl. Phys., 68, 3645 (1990).
11. S. Sugahara, T. Kitamura, S. Imai, and M. Matsumura, Appl. Surf. Sci., 82/83, 380 (1994).
12. Y. Sakuma, S. Muto, K. Makajima, and N. Yokoyama, Appl. Surf. Sci., 82/83, 239 (1994).
13. R. L. Puurunen, J. Appl. Phys., 97, 121301 (2005).
14. G. N. Patterson, Introduction to the Kinetic Theory of Gas Flows, University of Toronto Press, Toronto, CN, Canada (1971).
15. L. A. West and G. A. Somorjai, J. Chem. Phys., 54, 2864 (1971).
16. S. Tomoda and K. Kodera, Surf. Sci., 45, 657 (1974).
17. R. D. Levin and R. B. Bernstein, Molecular Reaction Dynamics and Chemical Reactivity, University of Oxford Press, New York (1987).
18. R. I. Masel, Principle of Adsorption and Reaction on Solid Surfaces, Wiley, New York (1996).