Atomic layer deposition of Ti O2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2 O

Journal of Applied Physics

Volumn 102, Issue 8, 2007, Pages

  Xie, Qi ^a   Jiang, Yu Long ^a   Detavernier, Christophe ^b   Deduytsche, Davy ^b   Van Meirhaeghe, Roland L ^b   Ru, Guo Ping ^a   Li, Bing Zong ^a   Qu, Xin Ping ^a  

^a FUDAN UNIVERSITY   (China)

^b GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMIDES; ATOMIC LAYER DEPOSITION; BEHAVIORAL RESEARCH; THERMAL EFFECTS; THIN FILMS; WATER;

DESORPTION BEHAVIOR; GROWTH BEHAVIORS; LIGAND EXCHANGE;

TITANIUM OXIDES;

EID: 35648995895     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2798384     Document Type: Article

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