On-wafer monitoring of vacuum-ultraviolet radiation damage in high-density plasma processes

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 12 B, 2001, Pages

  Samukawa, Seiji ^a,b   Ishikawa, Yasushi ^a,b   Kumagai, Shinya ^a,b   Okigawa, Mitsuru ^a,b  

^a TOHOKU UNIVERSITY   (Japan)

^b SANYO ELECTRIC CO LTD   (Japan)

Author keywords

Hole electron pair; On wafer monitoring; Pulsed plasma; Radiation damage; Vacuum ultraviolet

Indexed keywords

CARRIER CONCENTRATION; INDUCTIVELY COUPLED PLASMA; OPACITY; PHOTONS; PULSE TIME MODULATION; RADIATION DAMAGE; SEMICONDUCTING FILMS; SILICA; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS;

HOLE CURRENTS; PLASMA IRRADIATION;

PLASMA DENSITY;

EID: 0035894785     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l1346     Document Type: Article

References (4)