Electron-beam-induced deposition and post-treatment processes to locally generate clean titanium oxide nanostructures on Si(100)

Nanotechnology

Volumn 22, Issue 8, 2011, Pages

  Schirmer, M ^a   Walz, M M ^a   Vollnhals, F ^a   Lukasczyk, T ^a   Sandmann, A ^a   Chen, C ^b   Steinruck H P ^a   Marbach, H ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT CONDITIONS; DEPOSITION PROCESS; ELECTRON BEAM-INDUCED DEPOSITION; EX SITU; FOCUSED ELECTRON BEAMS; IMPACT POSITIONS; IN-SITU; IRRADIATED AREA; NANOCRYSTAL GROWTH; NANOFABRICATION TECHNIQUES; OXIDE NANOSTRUCTURES; OXYGEN ATMOSPHERE; POST-TREATMENT PROCEDURES; POST-TREATMENT PROCESS; PRECURSOR MOLECULES; PRIMARY ELECTRON BEAMS; PROXIMITY EFFECTS; SEM; SI(1 0 0); TIO; TITANIUM OXIDE NANOCRYSTALS; TITANIUM TETRAISOPROPOXIDE;

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DEPOSITS; ELECTRON BEAMS; HEATING; NANOCRYSTALS; OXYGEN; SCANNING ELECTRON MICROSCOPY; TITANIUM; TITANIUM OXIDES;

ELECTRONS;

EID: 79251578009     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/8/085301     Document Type: Article

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