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Volumn 25, Issue 6, 1997, Pages 430-446
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Elastic scattering corrections in AES and XPS. II. Estimating attenuation lengths and conditions required for their valid use in overlayer/substrate experiments
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Author keywords
AES; Attenuation length; Elastic scattering; IMFP; XPS
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Indexed keywords
APPROXIMATION THEORY;
AUGER ELECTRON SPECTROSCOPY;
COMPUTER SIMULATION;
ERROR ANALYSIS;
ERROR CORRECTION;
MATHEMATICAL MODELS;
MONTE CARLO METHODS;
SUBSTRATES;
X RAY PHOTOELECTRON SPECTROSCOPY;
ELASTIC SCATTERING;
INELASTIC MEAN FREE PATHS (IMFP);
INTERFACES (MATERIALS);
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EID: 0031168751
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1096-9918(199706)25:6<430::AID-SIA254>3.0.CO;2-7 Document Type: Article |
Times cited : (519)
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References (43)
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