Thin film growth of TiO2 and Ti2O3 by the new method of liquid injection CVD investigated using optical interferometry, XRD and AFM

Surface and Interface Analysis

Volumn 38, Issue 7, 2006, Pages 1122-1129

  Simcock, M N ^a  

^a UNIVERSITY OF SOUTH CAROLINA   (United States)

Author keywords

In situ optical monitoring; Liquid injection chemical vapour deposition; Metalorganic chemical vapour deposition; Oxides; Thin film; Titanium compounds; Titanium oxide

Indexed keywords

CARRIER GAS STREAM; IN SITU OPTICAL MONITORING; LIQUID INJECTION CHEMICAL VAPOUR DEPOSITION; TITANIUM TETRAISOPROPOXIDE (TTIP);

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; TITANIUM OXIDES; X RAY DIFFRACTION;

THIN FILMS;

EID: 33749543230     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2359     Document Type: Article

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