Solutions to a proximity effect in high resolution electron beam induced deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 5, 2007, Pages 1603-1608

  Van Dorp, W F ^a   Lazar, S ^a   Hagen, C W ^a   Kruit, P ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; COMPUTER SIMULATION; DEPOSITION; DEPOSITION RATES; DISTANCE MEASUREMENT; ELECTRON BEAM LITHOGRAPHY;

ELECTRON BEAM INDUCED DEPOSITION (EBID); PROXIMITY EFFECTS;

ELECTRON BEAMS;

EID: 34648826644     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2775456     Document Type: Article

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