Optimized molecule supply from nozzle-based gas injection systems for focused electron- and ion-beam induced deposition and etching: Simulation and experiment

Journal of Physics D: Applied Physics

Volumn 42, Issue 12, 2009, Pages

  Friedli, V ^a   Utke, I ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM-INDUCED DEPOSITION; CYLINDRICAL TUBES; FLAT SUBSTRATES; GAS INJECTION SYSTEM; HEATED SUBSTRATES; KNUDSEN NUMBERS; MONTE CARLO APPROACH; NEAR-FIELD DISTRIBUTION; NOZZLE ANGLE; NOZZLE EXITS; SHADOW EFFECTS; THERMAL DECOMPOSITIONS; TOTAL FLUX;

ATOMIZERS; MOLECULES; NOZZLES; PYROLYSIS; TUBES (COMPONENTS);

SUBSTRATES;

EID: 70349084635     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/12/125305     Document Type: Article

References (41)

1. Utke I, Hoffmann P and Melngailis J 2008 Gas-assisted focused electron beam and ion beam processing and fabrication J. Vac. Sci. Technol. B 26 1197-276
2. Folch A, Servat J, Esteve J, Tejada J and Seco M 1996 High-vacuum versus "environmental" electron beam deposition J. Vac. Sci. Technol. B 14 2609-14
3. Matsui S and Mori K 1984 New selective deposition technology by electron-beam induced surface-reaction Japan. J. Appl. Phys. Part 2-Lett. 23 L706-L8
4. Ochiai Y, Shihoyama K, Shiokawa T, Toyoda K, Masuyama A, Gamo K and Namba S 1986 Characteristics of maskless ion-beam assisted etching of silicon using focused ion-beams J. Vac. Sci. Technol. B 4 333-6
5. Lassiter M G and Rack P D 2008 Nanoscale electron beam induced etching: a continuum model that correlates the etch profile to the experimental parameters Nanotechnology 19 455306
6. Randolph S J, Fowlkes J D and Rack P D 2006 Focused, nanoscale electron-beam-induced deposition and etching Crit. Rev. Solid State Mater. Sci. 31 55-89
7. Smith D A, Fowlkes J D and Rack P D 2008 Understanding the kinetics and nanoscale morphology of electron-beam-induced deposition via a three-dimensional Monte Carlo simulation: the effects of the precursor molecule and the deposited material Small 4 1382-9
8. Smith D A, Fowlkes J D and Rack P D 2008 Simulating the effects of surface diffusion on electron beam induced deposition via a three-dimensional Monte Carlo simulation Nanotechnology 19 415704
9. Utke I, Friedli V, Purrucker M and Michler J 2007 Resolution in focused electron- and ion-beam induced processing J. Vac. Sci. Technol. B 25 2219-23
10. van Dorp W F and Hagen C W 2008 A critical literature review of focused electron beam induced deposition J. Appl. Phys. 104 081301
11. Hoyle P C, Ogasawara M, Cleaver J R A and Ahmed H 1993 Electrical-resistance of electron-beam-induced deposits from tungsten hexacarbonyl Appl. Phys. Lett. 62 3043-5
12. Utke I, Friedli V, Michler J, Bret T, Multone X and Hoffmann P 2006 Density determination of focused-electron-beam-induced deposits with simple cantilever-based method Appl. Phys. Lett. 88 031906
13. Utke I, Bret T, Laub D, Buffat P, Scandella L and Hoffmann P 2004 Thermal effects during focused electron beam induced deposition of nanocomposite magnetic-cobalt-containing tips Microelectron. Eng. 73-74 553-8
14. Utke I, Michler J, Gasser P, Santschi C, Laub D, Cantoni M, Buffat P A, Jiao C and Hoffmann P 2005 Cross section investigations of compositions and sub-structures of tips obtained by focused electron beam induced deposition Adv. Eng. Mater. 7 323-31
15. Adamson S and McGilp J F 1986 Measurement of gas flux distributions from single capillaries using a modified, UHV-compatible ion gauge, and comparison with theory Vacuum 36 227-32
16. Buckman S J, Gulley R J, Moghbelalhossein M and Bennett S J 1993 Spatial profiles of effusive molecular-beams and their dependence on gas species Meas. Sci. Technol. 4 1143-53
17. Rugamas F, Roundy D, Mikaelian G, Vitug G, Rudner M, Shih J, Smith D, Segura J and Khakoo M A 2000 Angular profiles of molecular beams from effusive tube sources: I. Experiment Meas. Sci. Technol. 11 1750-65
18. Guevremont J M, Sheldon S and Zaera F 2000 Design and characterization of collimated effusive gas beam sources: effect of source dimensions and backing pressure on total flow and beam profile Rev. Sci. Instrum. 71 3869-81
19. Blauner P G, Ro J S, Butt Y and Melngailis J 1989 Focused ion-beam fabrication of sub-micron gold structures J. Vac. Sci. Technol. B 7 609-17
20. Scheuer V, Koops H and Tschudi T 1986 Electron beam decomposition of carbonyls on silicon Microelectron. Eng. 5 423-30
21. Komuro M, Watanabe N and Hiroshima H 1990 Focused Ga Ion-beam etching of Si in chlorine gas Japan. J. Appl. Phys. Part 1-Regular Pap. Short Notes Rev. Pap. 29 2288-91
22. Kohlmann K T, Thiemann M and Brunger W H 1991 E-Beam induced x-ray mask repair with optimized gas nozzle geometry Microelectron. Eng. 13 279-82
23. El-Morsi M S, Wei A C, Nellis G F, Engelstad R L, Sijbrandij S, Stewart D and Mulders H 2004 Gas flow modeling for focused ion beam (FIB) repair processes Proc. of SPIE-The Int. Society for Optical Engineering (Monterey, CA) ed W Staud and J T Weed pp 467-76
24. Friedli V, Santschi C, Michler J, Hoffmann P and Utke I 2007 Mass sensor for in situ monitoring of focused ion and electron beam induced processes Appl. Phys. Lett. 90 053106
25. Utke I, Friedli V, Amorosi S, Michler J and Hoffmann P 2006 Measurement and simulation of impinging precursor molecule distribution in focused particle beam deposition/etch systems Microelectron. Eng. 83 1499-502
26. Roy S, Raju R, Chuang H F, Cruden B A and Meyyappan M 2003 Modeling gas flow through microchannels and nanopores J. Appl. Phys. 93 4870-9
27. Clausing P 1971 Flow of highly rarefied gases through tubes of arbitrary length J. Vac. Sci. Technol. 8 636
28. Friedli V 2009 http://www.empa.ch/GISsimulator
29. Smith C G and Lewin G 1966 Free molecular conductance of a cylindrical tube with wall sorption J. Vac. Sci. Technol. 3 92
30. Lafferty J M 1998 Foundations of Vacuum Science and Technology (New York: Wiley)
31. Bird G A 1994 Molecular Gas Dynamics and the Direct Simulation of Gas Flows (Oxford: Clarendon)
32. Friedli V 2008 Focused electron- and ion-beam induced processes: in situ monitoring, analysis and modelling PhD Thesis Ecole Polytechnique Fédérale de Lausanne
33. Herman M A and Sitter H 1996 Molecular beam Epitaxy Fundamentals and Current Status (Berlin: Springer)
34. Thomson S L and Owens W R 1975 Survey of flow at low-pressures Vacuum 25 151-6
35. 5 by chemical pretreatment of the dosing system J. Vac. Sci. Technol. a-Vac. Surf. Films 9 2785-7
36. Kodas T T and Hampden-Smith M J 1994 The Chemistry of Metal CVD (Weinheim: VCH)
37. West G A and Beeson K W 1988 Chemical vapor-deposition of cobalt silicide Appl. Phys. Lett. 53 740-2
38. Kunz R R and Mayer T M 1988 Electron-beam induced surface nucleation and low-temperature decomposition of metal-carbonyls J. Vac. Sci. Technol. B 6 1557-64
39. Garner M L, Chandra D and Lau K H 1995 Low-temperature vapor pressures of W-, Cr-, and Co-carbonyls J. Phase Equilib. 16 24-9
40. Bret T, Utke I and Hoffmann P 2005 Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures Microelectron. Eng. 78-79 307-13 (Pubitemid 40370977)
41. DeMarco A J and Melngailis J 1999 Lateral growth of focused ion beam deposited platinum for stencil mask repair J. Vac. Sci. Technol. B 17 3154-7