Selective deposition of anatase and rutile films by KrF laser chemical vapor deposition from titanium isopropoxide

Thin Solid Films

Volumn 406, Issue 1-2, 2002, Pages 132-137

  Watanabe, Akio ^a   Tsuchiya, Tetsuo ^a   Imai, Yoji ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Anatase; Chemical vapor deposition (CVD); KrF laser; Rutile; Ti(O i C3H7)4; TiO2

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LASER APPLICATIONS; QUARTZ; SOLID STATE LASERS; SUBSTRATES;

LASER REPETITION RATES; SELECTIVE DEPOSITION;

TITANIUM OXIDES;

EID: 0037051255     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01748-5     Document Type: Article

References (8)