Recapture of secondary electrons by the target in a DC planar magnetron discharge

Vacuum

Volumn 70, Issue 1, 2003, Pages 29-35

  Buyle, G ^a   De Bosscher, W ^b   Depla, D ^a   Eufinger, K ^a   Haemers, J ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

^b Sinvaco NV   (Belgium)

Author keywords

Magnetron discharge; Magnetron sputtering; Secondary electron yield; Secondary electrons

Indexed keywords

COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; ION BEAMS; MAGNETRON SPUTTERING; MONTE CARLO METHODS;

MAGNETRON DISCHARGE;

ELECTRIC DISCHARGES;

EID: 0037458775     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00664-4     Document Type: Article

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