A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 41, Issue 21, 2008, Pages

  Sarakinos, K ^a   Alami, J ^a   Dukwen, J ^a   Woerdenweber, J ^a   Wuttig, M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COPPER; DC GENERATORS; DEPOSITION RATES; IONIZATION OF GASES; IONS; MAGNETRONS; METAL IONS; SPUTTERING;

CARBON TARGETS; COPPER TARGETS; DEPOSITION PROCESSES; HIGH POWERS; ION FLUXES; IONIZATION PROBABILITIES; PROCESS PARAMETERS; PULSE DUTY CYCLES; PULSE FREQUENCIES; PULSED MAGNETRON SPUTTERING; QUANTITATIVE MODELS; RELATIVE FRACTIONS; SPUTTERING GASSES; SPUTTERING YIELDS; TARGET IONS; TARGET VOLTAGES;

TARGETS;

EID: 58149342089     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/21/215301     Document Type: Article

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