Nucleation and growth during the atomic layer deposition of W on Al 2O3 and Al2O3 on W

Thin Solid Films

Volumn 467, Issue 1-2, 2004, Pages 16-27

  Grubbs, R K ^a   Nelson, C E ^a   Steinmetz, N J ^b   George, S M ^a,b  

^a UNIVERSITY OF COLORADO   (United States)

^b UCB 450   (United States)

Author keywords

Aluminum oxide; Atomic layer deposition; Tungsten

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); NANOLAMINATES; THERMAL BARRIERS COATINGS;

ALUMINUM COMPOUNDS; AUGER ELECTRON SPECTROSCOPY; DEPOSITION; MIRRORS; NUCLEATION; THIN FILMS; X RAY ANALYSIS;

TUNGSTEN;

EID: 4444317998     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.099     Document Type: Article

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