Properties of Ta2O5-based dielectric nanolaminates deposited by atomic layer epitaxy

Journal of the Electrochemical Society

Volumn 144, Issue 1, 1997, Pages 300-306

  Kukli, Kaupo ^a,b   Ihanus, Jarkko ^a   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE MEASUREMENT; DEPOSITION; DIELECTRIC PROPERTIES; ELECTRIC CURRENT MEASUREMENT; EPITAXIAL GROWTH; LAMINATES; LEAKAGE CURRENTS; LUMINESCENT DEVICES; MULTILAYERS; NANOSTRUCTURED MATERIALS; TANTALUM COMPOUNDS; VOLTAGE MEASUREMENT;

ATOMIC LAYER EPITAXY; NANOLAMINATES; TANTALUM OXIDES;

FILM GROWTH;

EID: 0030737099     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837399     Document Type: Article

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