Ultra-thin SiO2 on Si VIII. Accuracy of method, linearity and attenuation lengths for XPS

Surface and Interface Analysis

Volumn 39, Issue 6, 2007, Pages 512-518

  Kim, Kyung Joong ^a   Seah, M P ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

Attenuation lengths; Calibration; Linearity; Silicon oxide; XPS

Indexed keywords

AMORPHOUS MATERIALS; CALIBRATION; COMPUTER SOFTWARE; CONTAMINATION; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

ATTENUATION LENGTHS; TRACEABLE MEASUREMENT;

ULTRATHIN FILMS;

EID: 34249096089     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2544     Document Type: Article

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