Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy

Applied Surface Science

Volumn 239, Issue 3-4, 2005, Pages 470-480

  Powell, C J ^a   Jablonski, A ^b   Werner, W S M ^c   Smekal, W ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Poland)

^c VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

AES; Auger electron spectroscopy; Databases; Film thicknesses; Quantitative analysis; Spectrum simulation; X ray photoelectron spectroscopy; XPS

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL ANALYSIS; COMPUTER SIMULATION; DATABASE SYSTEMS; ELECTRON EMISSION; ELECTRON SCATTERING; FLUORESCENCE; MULTILAYERS; X RAY PHOTOELECTRON SPECTROSCOPY;

AES; EFFECTIVE ATTENUATION LENGTH (EAL); FILM THICKNESSES; SPECTRUM SIMULATION;

THIN FILMS;

EID: 10644236982     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.06.012     Document Type: Article

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