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Volumn 19, Issue 5, 2001, Pages 2604-2611

Influence of elastic-electron scattering on measurements of silicon dioxide film thicknesses by x-ray photoelectron spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON EMISSION; ELECTRON SCATTERING; ERROR ANALYSIS; MAGNESIUM PRINTING PLATES; PHOTOEMISSION; SILICA; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

EID: 0035443411     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1397463     Document Type: Article
Times cited : (35)

References (38)
  • 22
    • 0003175846 scopus 로고    scopus 로고
    • Characterization and Metrology for ULSI Technology-2000, edited by D. G. Seiler, A. C. Diebold, T. J. Shaffner, R. McDonald, W. M. Bullis, P. J. Smith, and E. M. Secula, American Institute of Physics, Melville, New York
    • (2001) AIP Conf. Proc. , vol.1550 , pp. 591
    • Powell, C.J.1    Jablonski, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.