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Volumn 19, Issue 5, 2001, Pages 2604-2611
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Influence of elastic-electron scattering on measurements of silicon dioxide film thicknesses by x-ray photoelectron spectroscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON EMISSION;
ELECTRON SCATTERING;
ERROR ANALYSIS;
MAGNESIUM PRINTING PLATES;
PHOTOEMISSION;
SILICA;
THICKNESS MEASUREMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAYS;
EFFECTIVE ATTENUATION LENGTHS (EAL);
PHOTOELECTRONS;
THIN FILMS;
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EID: 0035443411
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1397463 Document Type: Article |
Times cited : (35)
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References (38)
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