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Journal of Electron Spectroscopy and Related Phenomena

Volumn 98-99, Issue , 1999, Pages 1-15

Surface sensitivity of Auger-electron spectroscopy and X-ray photoelectron spectroscopy

(5) Powell, C J a Jablonski, A b Tilinin, I S c Tanuma, S d Penn, D R a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

b POLISH ACADEMY OF SCIENCES (Poland)

c LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

d Arc Corporation (Japan)

Author keywords

Auger electron spectroscopy; Elastic electron scattering; Inelastic electron scattering; Surface sensitivity; X ray photoelectron spectroscopy

Indexed keywords

EID: 0001823424 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/s0368-2048(98)00271-0 Document Type: Article

Times cited : (197)

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