Refined calculations of effective attenuation lengths for SiO2 film thicknesses by x-ray photoelectron spectroscopy

Applied Physics Letters

Volumn 89, Issue 25, 2006, Pages

  Powell, C J ^a   Werner, W S M ^b   Smekal, W ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATION LENGTHS; INELASTIC-SCATTERING PROBABILITIES;

ALGORITHMS; APPROXIMATION THEORY; ATTENUATION; MONTE CARLO METHODS; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 33845938219     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2422903     Document Type: Article

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