The electron attenuation length revisited

Surface Science Reports

Volumn 47, Issue 2-3, 2002, Pages 33-91

  Jablonski, A ^a   Powell, C J ^b  

^a POLISH ACADEMY OF SCIENCES   (Poland)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Auger electron spectroscopy; Computer simulations; Diffraction; Elctron solid scattering and transmission inelastic; Electron solid interactions; Electron solid scattering and transmission elastic; Gold; Scattering; Silicon; X ray photoelectron spectrosopy

Indexed keywords

ATTENUATION; AUGER ELECTRON SPECTROSCOPY; ELECTRON DIFFRACTION; ELECTRON SCATTERING; GOLD; MORPHOLOGY; SEMICONDUCTING FILMS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

EFFECTIVE ATTENUATION LENGTH (EAL);

SURFACE CHEMISTRY;

EID: 0036606237     PISSN: 01675729     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0167-5729(02)00031-6     Document Type: Article

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