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Volumn 202, Issue 4-7, 2007, Pages 895-903

Computer simulation of magnetron sputtering - Experience from the industry

Author keywords

Computer simulation; Magnetron sputtering; Monte Carlo; Plasma

Indexed keywords

COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; ELECTRONS; MAGNETIC FIELD EFFECTS; MONTE CARLO METHODS; PLASMAS; REACTIVE SPUTTERING;

EID: 36048982214     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.06.043     Document Type: Article
Times cited : (14)

References (67)
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    • S. Kadlec, Plasma Processes and Polymers, (in press).
  • 54
    • 77957061855 scopus 로고    scopus 로고
    • Academic Press, San Diego, CA
    • Cale T.S., and Mahadev V. Thin Films vol. 22 (1996), Academic Press, San Diego, CA 175
    • (1996) Thin Films , vol.22 , pp. 175
    • Cale, T.S.1    Mahadev, V.2
  • 61
    • 36049043279 scopus 로고    scopus 로고
    • B. Heinz, M. Dubs, T. Eisenhammer, P. Grunenfelder, W. Haag, S. Kadlec, S. Krassnitzer, US pat. No. 6,860,977 and 6,682,637.
  • 64
    • 36049007276 scopus 로고    scopus 로고
    • S. Krassnitzer, US patent No. 6,821,397.
  • 65
    • 36048968956 scopus 로고    scopus 로고
    • S. Kadlec, E. Kugler, T. Halter, US patent No. 7,138,343.
  • 67
    • 36049008558 scopus 로고    scopus 로고
    • W. Haag, P. Grunenfelder, U. Schwendener, M. Schlegel, S. Krassnitzer, US patent No. 6,454,920 and 6,679,977.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.