Multi-scale simulation of plasma generation and film deposition in a circular type DC magnetron sputtering system

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 17-23

  Kwon, U H ^a   Choi, S H ^a   Park, Y H ^b   Lee, W J ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Sunic System Ltd   (South Korea)

Author keywords

Computer simulation; Monte Carlo collision; Particle in cell; Plasma processing and deposition; Sputtering

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DEPOSITION; KINETIC ENERGY; MONTE CARLO METHODS; PLASMAS;

EQUI-VOLUME RATE MODEL (EVRM); MONTE CARLO COLLISION; PARTICLE-IN-CELL (PIC); PLASMA PROCESSING AND DEPOSITION;

MAGNETRON SPUTTERING;

EID: 13444267561     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.038     Document Type: Conference Paper

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