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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2554-2566

Mechanism of the film composition formation during magnetron sputtering of WTi

(6) Shaginyan, L R a Misina M b Kadlec, S b Jastrabik L b Mackova A c Perina V c

a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE (Ukraine)

b INSTITUTE OF PHYSICS (Czech Republic)

c NUCLEAR PHYSICS INSTITUTE (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY ALLOYS; COMPOSITION EFFECTS; COMPUTER SIMULATION; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MONTE CARLO METHODS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES;

DIRECT SIMULATION MONTE CARLO (DSMC) METHODS; FILM COMPOSITION;

METALLIC FILMS;

EID: 0035441835 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1392401 Document Type: Article

Times cited : (52)

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