SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 192, Issue 1-4, 2002, Pages 201-215

Application and simulation of low temperature plasma processes in semiconductor manufacturing

(6) Ventzek, P L G a Rauf, S a Stout, P J a Zhang, D a Dauksher, W b Hall, E a

a MOTOROLA INC (United States)

b MOTOROLA INC (United States)

Author keywords

Plasma; Semiconductor; Simulation

Indexed keywords

CMOS INTEGRATED CIRCUITS; DIELECTRIC MATERIALS; ELECTRON BEAM LITHOGRAPHY; MASKS; METALLIZING; PLASMA ETCHING; PLASMA SIMULATION;

PLASMA PROCESSES;

PLASMAS;

EID: 0037198328 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/S0169-4332(02)00027-2 Document Type: Conference Paper

Times cited : (10)

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