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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2652-2663

Trench filling by ionized metal physical vapour deposition

(2) Lu, J a Kushner, M J a

a University of Illinois at Urbana Champaign (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE MEASUREMENT; ANISOTROPY; ASPECT RATIO; INDUCTIVELY COUPLED PLASMA; INTEGRATED CIRCUIT MANUFACTURE; IONIZATION; IONS; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION;

TRENCH FILLING;

PLASMA DEVICES;

EID: 0035441825 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1399318 Document Type: Article

Times cited : (62)

References (21)

1
- 0009350526
- (1998) Solid State Technol. , vol.41 , pp. 85
- Lee, K.¹

2
- 0000332851
- (1998) Phys. Plasmas , vol.5 , pp. 1624
- Hopwood, J.¹

3
- 6744251985
- (2000) Semicond. Int. , vol.23 , pp. 97
- Cunningham, J.A.¹

4
- 0000522608
- (1994) J. Vac. Sci. Technol. B , vol.12 , pp. 449
- Rossnagel, S.M.¹ Hopwood, J.²

5
- 0001123808
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 2585
- Rossnagel, S.M.¹

6
- 0029275415
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 183
- Hamaguchi, S.¹ Rossnagel, S.M.²

7
- 0029275124
- (1995) J. Vac. Sci. Technol. B , vol.13 , pp. 203
- Cheng, P.F.¹ Rossnagel, S.M.² Ruzic, D.N.³

8
- 0033204910
- (1999) IEEE Trans. Plasma Sci. , vol.27 , pp. 1433
- Vyvoda, M.A.¹ Abrams, C.F.² Graves, D.B.³

9
- 0001396826
- (2000) J. Appl. Phys. , vol.87 , pp. 7198
- Lu, J.¹ Kushner, M.J.²

10
- 0031187015
- (1997) J. Vac. Sci. Technol. A , vol.15 , pp. 1913
- Hoekstra, R.J.¹ Grapperhaus, M.J.² Kushner, M.J.³

11
- 0001057739
- (2001) J. Appl. Phys. , vol.89 , pp. 878
- Lu, J.¹ Kushner, M.J.²

12
- 0003145735
- (1999) Vacuum , vol.52 , pp. 435
- Wei, H.¹ Liu, Z.² Yao, K.³

13
- 0002915776
- (1998) J. Appl. Phys. , vol.83 , pp. 35
- Grapperhaus, M.J.¹ Krivokapic, Z.² Kushner, M.J.³

14
- 33751416523
- (1984) At. Data Nucl. Data Tables , vol.31 , pp. 1
- Masunami, N.¹ Yamamura, Y.² Itikawa, Y.³ Itoh, N.⁴ Kazumata, S.⁵ Miyagawa, S.⁶ Morita, K.⁷ Shimizu, R.⁸ Tawara, H.⁹

15
- 0003091859
- (1999) Thin Films , vol.26 , pp. 27
- Powell, R.A.¹ Rossnagel, S.²

16
- 0001644389
- (1997) J. Appl. Phys. , vol.82 , pp. 3552
- Hanson, D.E.¹ Voter, A.F.² Kress, J.D.³

17
- 0033414545
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 2819
- Kress, J.D.¹ Hanson, D.E.² Voter, A.F.³ Liu, C.L.⁴ Liu, X.Y.⁵ Coronell, D.G.⁶

18
- 0033734058
- (2000) Plasma Sources Sci. Technol. , vol.9 , pp. 199
- Suzuki, K.¹ Konishi, K.² Nakamura, N.³ Sugai, H.⁴

19
- 84950555774
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 19
- Rossnagel, S.M.¹

20
- 0001509042
- (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 3008

21
- 0034321527
- (2000) Plasma Sources Sci. Technol. , vol.9 , pp. 562
- Andrew, Y.¹ Booske, J.H.² Lu, S.³ Snodgrass, T.G.⁴ Wendt, A.E.⁵

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