Fundamental aspects in non-reactive and reactive magnetron discharges

Plasma Sources Science and Technology

Volumn 12, Issue 4, 2003, Pages

  Bretagne, J ^a   Laporte, C Boisse ^a   Gousset, G ^a   Leroy, O ^a   Minea, T M ^b   Pagnon, D ^a   De Poucques, L ^a   Touzeau, M ^a  

^a UNIVERSITÉ PARIS SUD   (France)

^b INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; INDUSTRIAL APPLICATIONS; IONIZATION; MAGNETRONS; PHYSICAL VAPOR DEPOSITION; PLASMAS; THIN FILMS;

DISCHARGE PHYSICS; IONIZED PHYSICAL VAPOUR DEPOSITION; NON-REACTIVE MAGNETRON DISCHARGE; PLASMA-SURFACE INTERACTION; REACTIVE MAGNETRON DISCHARGE;

MAGNETRON SPUTTERING;

EID: 0345356294     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/4/318     Document Type: Article

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