Modeling of the target surface modification by reactive ion implantation during magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1524-1529

  Depla, D ^a   Chen, Z Y ^b   Bogaerts, A ^b   Ignatova, V ^b   De Gryse, R ^a   Gijbels, R ^b  

^a GHENT UNIVERSITY   (Belgium)

^b UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

INCIDENT ENERGY; MAGNETRON DISCHARGE; REACTIVE ION IMPLANTATION; SURFACE CONCENTRATION;

ALUMINA; ARGON; COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; EROSION; ION BOMBARDMENT; ION IMPLANTATION; MAGNETRON SPUTTERING; MONTE CARLO METHODS; OXYGEN; SILICON NITRIDE;

SURFACE TREATMENT;

EID: 4344710659     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1705641     Document Type: Conference Paper

References (11)

1. I. Safi, Surf. Coat. Technol. 127, 203 (2000).
2. D. Depla, A. Colpaert, K. Eufinger, A. Segers, J. Haemers, and R. De Gryse, Vacuum 66, 9 (2002).
3. D. Depla and R. De Gryse, Plasma Sources Sci. Technol. 10, 547 (2001).
4. D. Depla and R. De Gryse, Plasma Sources Sci. Technol. 11, 91 (2002).
5. D. Depla and R. De Gryse, Vacuum 69, 529 (2003).
6. Z. Y. Chen, A. Bogaerts, D. Depla, and V. Ignatova, Nucl. Instrum. Methods Phys. Res. B 207, 415 (2003).
7. D. Depla and R. De Gryse, Surf. Coat. Technol. (accepted for publication).
8. W. Möller, W. Eckstein, and J. P. Biersack, Comput. Phys. Commun. 51, 355 (1988); W. Möller and M. Posselt, TRIDYN FZR User Manual.
9. W. Möller, W. Eckstein, and J. P. Biersack, Comput. Phys. Commun. 51, 355 (1988); W. Möller and M. Posselt, TRIDYN FZR User Manual.
10. S. Berg, H.-O. Blom, T. Larsson, and C. Nender, J. Vac. Sci. Technol. A 5, 202 (1987).
11. W. L. Patterson and G. A. Shirn, J. Vac. Sci. Technol. 4, 343 (1968).