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Volumn 53, Issue 12, 2006, Pages 3063-3069

Simulation study of individual and combined sources of intrinsic parameter fluctuations in conventional nano-MOSFETs

Author keywords

Intrinsic parameter fluctuations; MOSFETs; Numerical simulation

Indexed keywords

COMPUTER SIMULATION; QUANTUM THEORY; RANDOM PROCESSES; STATISTICAL METHODS; SURFACE ROUGHNESS;

EID: 33947265310     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2006.885683     Document Type: Article
Times cited : (261)

References (40)
  • 1
    • 33745116218 scopus 로고    scopus 로고
    • A look into the future of nanoelectronics
    • G. Decklerk, "A look into the future of nanoelectronics," in VLSI Symp. Tech. Dig., 2005, pp. 6-7.
    • (2005) VLSI Symp. Tech. Dig , pp. 6-7
    • Decklerk, G.1
  • 2
    • 84907709834 scopus 로고    scopus 로고
    • Impact of parametric mismatch and fluctuations on performance and yield of deep-submicron CMOS technologies
    • Florence, Italy
    • H. P. Tuinhout, "Impact of parametric mismatch and fluctuations on performance and yield of deep-submicron CMOS technologies," in Proc. ESSDERC, Florence, Italy, 2002, pp. 95-101.
    • (2002) Proc. ESSDERC , pp. 95-101
    • Tuinhout, H.P.1
  • 3
    • 14844337078 scopus 로고    scopus 로고
    • Impact of intrinsic parameter fluctuations in decanano MOSFETs on yield and functionality of SRAM cells
    • May
    • B. Cheng, S. Roy, G. Roy, F. Adamu-Lema, and A. Asenov, "Impact of intrinsic parameter fluctuations in decanano MOSFETs on yield and functionality of SRAM cells," Solid State Electron., vol. 49, no. 5, pp. 740-746, May 2005.
    • (2005) Solid State Electron , vol.49 , Issue.5 , pp. 740-746
    • Cheng, B.1    Roy, S.2    Roy, G.3    Adamu-Lema, F.4    Asenov, A.5
  • 4
    • 0042912833 scopus 로고    scopus 로고
    • Simulation of intrinsic parameter fluctuations in decananometre and nanometre scale MOSFETs
    • Sep
    • A. Asenov, A. R. Brown, J. H. Davies, S. Kaya, and G. Slavcheva, "Simulation of intrinsic parameter fluctuations in decananometre and nanometre scale MOSFETs," IEEE Trans. Electron Devices, vol. 50, no. 9, pp. 1837-1852, Sep. 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.9 , pp. 1837-1852
    • Asenov, A.1    Brown, A.R.2    Davies, J.H.3    Kaya, S.4    Slavcheva, G.5
  • 5
    • 0016538539 scopus 로고
    • Effect of randomness in the distribution of impurity ions on FET thresholds in integrated electronics
    • Aug
    • R. W. Keyes, "Effect of randomness in the distribution of impurity ions on FET thresholds in integrated electronics," IEEE J. Solid-State Circuits, vol. SSC-10, no. 4, pp. 245-247, Aug. 1975.
    • (1975) IEEE J. Solid-State Circuits , vol.SSC-10 , Issue.4 , pp. 245-247
    • Keyes, R.W.1
  • 6
    • 0028548950 scopus 로고
    • Experimental study of threshold voltage fluctuation due to statistical variation of channel dopant number in MOSFETs
    • Nov
    • T. Mizuno, J. Okamura, and A. Toriumi, "Experimental study of threshold voltage fluctuation due to statistical variation of channel dopant number in MOSFETs," IEEE Trans. Electron Devices, vol. 41, no. 11, pp. 2216-2221, Nov. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , Issue.11 , pp. 2216-2221
    • Mizuno, T.1    Okamura, J.2    Toriumi, A.3
  • 7
    • 0022891057 scopus 로고
    • Characterisation and modelling of mismatch in MOS transistors for precision analogue design
    • Dec
    • K. R. Lakshmikumar, R. A. Hadaway, and M. A. Copeland, "Characterisation and modelling of mismatch in MOS transistors for precision analogue design," IEEE J. Solid-State Circuits, vol. SSC-21, no. 6, pp. 1057-1066, Dec. 1986.
    • (1986) IEEE J. Solid-State Circuits , vol.SSC-21 , Issue.6 , pp. 1057-1066
    • Lakshmikumar, K.R.1    Hadaway, R.A.2    Copeland, M.A.3
  • 8
    • 0031646544 scopus 로고    scopus 로고
    • Matching analysis of deposition defined 50-nm MOSFETs
    • Jan
    • J. T. Horstmann, U. Hilleringmann, and K. F. Goser, "Matching analysis of deposition defined 50-nm MOSFETs," IEEE Trans. Electron Devices, vol. 45, no. 1, pp. 299-306, Jan. 1997.
    • (1997) IEEE Trans. Electron Devices , vol.45 , Issue.1 , pp. 299-306
    • Horstmann, J.T.1    Hilleringmann, U.2    Goser, K.F.3
  • 9
    • 0030396105 scopus 로고    scopus 로고
    • The effect of statistical dopant fluctuations on MOS device performance
    • P. A. Stolk and D. B. M. Klaasen, "The effect of statistical dopant fluctuations on MOS device performance," in IEDM Tech. Dig., 1996, pp. 627-630.
    • (1996) IEDM Tech. Dig , pp. 627-630
    • Stolk, P.A.1    Klaasen, D.B.M.2
  • 10
    • 0035364688 scopus 로고    scopus 로고
    • An experimentally validated analytical model for gate line edge roughness (LER) effects on technology scaling
    • Jun
    • C. H. Diaz, H.-J. Tao, Y.-C. Ku, A. Yen, and K. Young, "An experimentally validated analytical model for gate line edge roughness (LER) effects on technology scaling," IEEE Electron Device Lett., vol. 22, no. 6, pp. 287-289, Jun. 2001.
    • (2001) IEEE Electron Device Lett , vol.22 , Issue.6 , pp. 287-289
    • Diaz, C.H.1    Tao, H.-J.2    Ku, Y.-C.3    Yen, A.4    Young, K.5
  • 11
    • 10644264480 scopus 로고    scopus 로고
    • Experimental investigation of the effect of LWR on sub-100-nm device performance
    • Dec
    • H.-W. Kim, J.-Y. Lee, J. Shin, S.-G. Woo, H.-K. Cho, and J.-T. Moon, "Experimental investigation of the effect of LWR on sub-100-nm device performance," IEEE Trans. Electron Devices, vol. 51, no. 12, pp. 1984-1988, Dec. 2004.
    • (2004) IEEE Trans. Electron Devices , vol.51 , Issue.12 , pp. 1984-1988
    • Kim, H.-W.1    Lee, J.-Y.2    Shin, J.3    Woo, S.-G.4    Cho, H.-K.5    Moon, J.-T.6
  • 13
    • 0042532317 scopus 로고    scopus 로고
    • Intrinsic parameter fluctuations in decananometre MOSFETs introduced by gate line edge roughness
    • May
    • A. Asenov, S. Kaya, and A. R. Brown, "Intrinsic parameter fluctuations in decananometre MOSFETs introduced by gate line edge roughness," IEEE Trans. Electron Devices, vol. 50, no. 5, pp. 1254-1260, May 2003.
    • (2003) IEEE Trans. Electron Devices , vol.50 , Issue.5 , pp. 1254-1260
    • Asenov, A.1    Kaya, S.2    Brown, A.R.3
  • 14
    • 0036247929 scopus 로고    scopus 로고
    • Intrinsic threshold voltage fluctuations in decanano MOSFETs due to local oxide thickness variations
    • Jan
    • A. Asenov, S. Kaya, and J. H. Davies, "Intrinsic threshold voltage fluctuations in decanano MOSFETs due to local oxide thickness variations," IEEE Trans. Electron Devices, vol. 49, no. 1, pp. 112-119, Jan. 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , Issue.1 , pp. 112-119
    • Asenov, A.1    Kaya, S.2    Davies, J.H.3
  • 15
    • 0346332488 scopus 로고    scopus 로고
    • Quantum mechanical effects on random oxide thickness and random dopant induced fluctuations in ultrasmall semiconductor devices
    • Dec
    • P. Andrei and I. Mayergoyz, "Quantum mechanical effects on random oxide thickness and random dopant induced fluctuations in ultrasmall semiconductor devices," J. Appl. Phys., vol. 94, no. 11, pp. 7163-7172, Dec. 2003.
    • (2003) J. Appl. Phys , vol.94 , Issue.11 , pp. 7163-7172
    • Andrei, P.1    Mayergoyz, I.2
  • 16
    • 0842331392 scopus 로고    scopus 로고
    • Atomistic 3-D process/device simulation considering gate line edge roughness and poly-Si random crystal orientation effects
    • M. Hane, T. Ikezawa, and T. Ezaki, "Atomistic 3-D process/device simulation considering gate line edge roughness and poly-Si random crystal orientation effects," in IEDM Tech. Dig., 2003, pp. 241-244.
    • (2003) IEDM Tech. Dig , pp. 241-244
    • Hane, M.1    Ikezawa, T.2    Ezaki, T.3
  • 17
    • 0027813761 scopus 로고
    • Three-dimensional 'atomistic' simulation of discrete random dopant distribution effects in sub-0.1 mm MOSFETs
    • H.-S. Wong and Y. Taur, "Three-dimensional 'atomistic' simulation of discrete random dopant distribution effects in sub-0.1 mm MOSFETs," in IEDM Tech. Dig., 1993, pp. 705-708.
    • (1993) IEDM Tech. Dig , pp. 705-708
    • Wong, H.-S.1    Taur, Y.2
  • 18
    • 0026837975 scopus 로고
    • Effects of mesoscopic fluctuations in dopant distributions on MOSFET threshold voltage
    • Mar
    • K. Nishiohara, N. Shiguo, and T. Wada, "Effects of mesoscopic fluctuations in dopant distributions on MOSFET threshold voltage," IEEE Trans. Electron Devices, vol. 39, no. 3, pp. 634-639. Mar. 1992.
    • (1992) IEEE Trans. Electron Devices , vol.39 , Issue.3 , pp. 634-639
    • Nishiohara, K.1    Shiguo, N.2    Wada, T.3
  • 19
    • 0032320827 scopus 로고    scopus 로고
    • Random dopant induced threshold voltage lowering and fluctuations in sub-0.1 μm MOSFETs: A 3-D 'atomistic' simulation study
    • Dec
    • A. Asenov, "Random dopant induced threshold voltage lowering and fluctuations in sub-0.1 μm MOSFETs: A 3-D 'atomistic' simulation study," IEEE Trans. Electron Devices, vol. 45, no. 12, pp. 2505-2513, Dec. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , Issue.12 , pp. 2505-2513
    • Asenov, A.1
  • 20
    • 0033281305 scopus 로고    scopus 로고
    • Monte Carlo modeling of threshold variation due to dopant fluctuations
    • D. J. Frank, Y. Taur, M. Ieong, and H.-S. P. Wong, "Monte Carlo modeling of threshold variation due to dopant fluctuations," in VLSI Symp. Tech. Dig., 1999, pp. 169-170.
    • (1999) VLSI Symp. Tech. Dig , pp. 169-170
    • Frank, D.J.1    Taur, Y.2    Ieong, M.3    Wong, H.-S.P.4
  • 21
    • 0037087352 scopus 로고    scopus 로고
    • Three-dimensional simulation of ultrasmall metal-oxide-scmiconductor field effect transistors: The role of the discrete impurities on the device terminal characteristics
    • Mar
    • W. J. Goss, D. Vasileska, and D. K. Ferry, "Three-dimensional simulation of ultrasmall metal-oxide-scmiconductor field effect transistors: The role of the discrete impurities on the device terminal characteristics," J. Appl. Phys, vol. 91, no. 6, pp. 3737-3740. Mar. 2002.
    • (2002) J. Appl. Phys , vol.91 , Issue.6 , pp. 3737-3740
    • Goss, W.J.1    Vasileska, D.2    Ferry, D.K.3
  • 23
    • 0036928972 scopus 로고    scopus 로고
    • Determination of the line edge roughness specification for 34-nm devices
    • T. Linton, M. Chandhok, B. J. Rice, and G. Schrom, "Determination of the line edge roughness specification for 34-nm devices," in IEDM Tech. Dig., 2002, pp. 303-306.
    • (2002) IEDM Tech. Dig , pp. 303-306
    • Linton, T.1    Chandhok, M.2    Rice, B.J.3    Schrom, G.4
  • 24
    • 0041537563 scopus 로고    scopus 로고
    • Intrinsic fluctuations in sub 10 nm double-gate MOSFETs introduced by discreteness of charge and matter
    • Dec
    • A. R. Brown, A. Asenov, and J. R. Watling, "Intrinsic fluctuations in sub 10 nm double-gate MOSFETs introduced by discreteness of charge and matter," IEEE Trans. Nanotechnol., vol. 1, no. 4, pp. 195-200, Dec. 2002.
    • (2002) IEEE Trans. Nanotechnol , vol.1 , Issue.4 , pp. 195-200
    • Brown, A.R.1    Asenov, A.2    Watling, J.R.3
  • 25
    • 24944468332 scopus 로고    scopus 로고
    • Intrinsic parameter fluctuations in conventional MOSFETs at the scaling limit: A statistical study
    • Oct
    • F. Adamu-Lema, G. Roy, A. R. Brown, A. Asenov, and S. Roy, "Intrinsic parameter fluctuations in conventional MOSFETs at the scaling limit: A statistical study," J. Comput. Electron., vol. 3, no. 3/4, pp. 203-206, Oct. 2004.
    • (2004) J. Comput. Electron , vol.3 , Issue.3-4 , pp. 203-206
    • Adamu-Lema, F.1    Roy, G.2    Brown, A.R.3    Asenov, A.4    Roy, S.5
  • 26
    • 20344371004 scopus 로고    scopus 로고
    • Quantum mechanical and transport aspects of resolving discrete charges in nano-CMOS device simulation
    • Munich, Germany
    • A. Asenov, G. Roy, C. Alexander, A. R. Brown, J. R. Watling, and S. Roy, "Quantum mechanical and transport aspects of resolving discrete charges in nano-CMOS device simulation," in Proc. 4th IEEE Conf. Nanotechnol., Munich, Germany, 2004, pp. 334-336.
    • (2004) Proc. 4th IEEE Conf. Nanotechnol , pp. 334-336
    • Asenov, A.1    Roy, G.2    Alexander, C.3    Brown, A.R.4    Watling, J.R.5    Roy, S.6
  • 27
    • 33751433581 scopus 로고    scopus 로고
    • Simulation of combined sources of intrinsic parameter fluctuations in a 'Real' 35 nm MOSFET
    • Grenoble, France
    • G. Roy, F. Adamu-Lema, A. R. Brown, S. Roy, and A. Asenov, "Simulation of combined sources of intrinsic parameter fluctuations in a 'Real' 35 nm MOSFET," in Proc. ESSDERC, Grenoble, France, 2005, pp. 337-340.
    • (2005) Proc. ESSDERC , pp. 337-340
    • Roy, G.1    Adamu-Lema, F.2    Brown, A.R.3    Roy, S.4    Asenov, A.5
  • 31
    • 0035307248 scopus 로고    scopus 로고
    • Increase in the random dopant induced threshold fluctuations and lowering in sub 100 nm MOSFETs due to quantum effects: A 3-D density-gradient simulation study
    • Apr
    • A. Asenov, G. Slavcheva, A. R. Brown, J. H. Davies, and S. Saini, "Increase in the random dopant induced threshold fluctuations and lowering in sub 100 nm MOSFETs due to quantum effects: A 3-D density-gradient simulation study," IEEE Trans. Electron Devices, vol. 48, no. 4, pp. 722-729, Apr. 2001.
    • (2001) IEEE Trans. Electron Devices , vol.48 , Issue.4 , pp. 722-729
    • Asenov, A.1    Slavcheva, G.2    Brown, A.R.3    Davies, J.H.4    Saini, S.5
  • 33
    • 0036473348 scopus 로고    scopus 로고
    • On discrete random dopant modelling in drift-diffusion simulations: Physical meaning of 'atomistic' dopants
    • Feb
    • N. Sano, K. Matsuzawa, M. Mukai, and N. Nakayama, "On discrete random dopant modelling in drift-diffusion simulations: Physical meaning of 'atomistic' dopants," Microelectron. Reliab., vol. 42, no. 2, pp. 189-199, Feb. 2002.
    • (2002) Microelectron. Reliab , vol.42 , Issue.2 , pp. 189-199
    • Sano, N.1    Matsuzawa, K.2    Mukai, M.3    Nakayama, N.4
  • 34
    • 3142706175 scopus 로고    scopus 로고
    • The use of quantum potentials for confinement and tunnelling in semiconductor devices
    • Dec
    • A. Asenov, J. R. Watling, A. R. Brown, and D. K. Ferry, "The use of quantum potentials for confinement and tunnelling in semiconductor devices," J. Comput. Electron., vol. 1, no. 4, pp. 503-513, Dec. 2002.
    • (2002) J. Comput. Electron , vol.1 , Issue.4 , pp. 503-513
    • Asenov, A.1    Watling, J.R.2    Brown, A.R.3    Ferry, D.K.4
  • 36
    • 3242675991 scopus 로고    scopus 로고
    • Bipolar quantum corrections in resolving individual dopants in 'atomistic' device simulations
    • Sep./Dec
    • G. Roy, A. R. Brown, A. Asenov, and S. Roy, "Bipolar quantum corrections in resolving individual dopants in 'atomistic' device simulations," Superlattices Microstruct., vol. 34, no. 3-6, pp. 327-334, Sep./Dec. 2004.
    • (2004) Superlattices Microstruct , vol.34 , Issue.3-6 , pp. 327-334
    • Roy, G.1    Brown, A.R.2    Asenov, A.3    Roy, S.4
  • 38
    • 0033169519 scopus 로고    scopus 로고
    • Suppression of random dopant induced threshold voltage fluctuations in sub-0.1 μm MOSFETs with epitaxial and delta doped channels
    • Aug
    • A. Asenov and S. Saini, "Suppression of random dopant induced threshold voltage fluctuations in sub-0.1 μm MOSFETs with epitaxial and delta doped channels," IEEE Trans. Electron Devices, vol. 46, no. 8, pp. 1718-1724, Aug. 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , Issue.8 , pp. 1718-1724
    • Asenov, A.1    Saini, S.2
  • 39
    • 33745131794 scopus 로고    scopus 로고
    • Direct measurement of effects of shallowtrench isolation on carrier profiles in sub-50 nm n-MOSFETs
    • H. Fukutome, Y. Momiyama, Y. Tagawa, T. Kubo, T. Aoyama, H. Arimoto, and Y. Nara, "Direct measurement of effects of shallowtrench isolation on carrier profiles in sub-50 nm n-MOSFETs," in VLSI Symp. Tech. Dig., 2005, pp. 140-141.
    • (2005) VLSI Symp. Tech. Dig , pp. 140-141
    • Fukutome, H.1    Momiyama, Y.2    Tagawa, Y.3    Kubo, T.4    Aoyama, T.5    Arimoto, H.6    Nara, Y.7
  • 40
    • 4544387565 scopus 로고    scopus 로고
    • F. Arnaud, B. Duriez, B. Tavel, L. Pain, J. Todeschini, M. Jurdit, Y. Laplanche, F. Boeuf, F. Salvetti, D. Lenoble, J. P. Reynard, F. Wacquant, P. Morin, N. Emonet, D. Barge, M. Bidaud, D. Ceccarelli, P. Vannier, Y. Loquet, H. Leninger, F. Judong, C. Perrot, I. Guilmeau, R. Palla, A. Beverina, V. DeJonghe, M. Brockaart, V. Vachellerie, R. A. Blanchi, B. Borot, T. Devoivre, N. Bicaïs, D. Roy, M. Denais, K. Rochereau, R. Difrenza, N. Planes, H. Brut, L. Vishnobulta, D. Reber, P. Stolk, and M. Woo, Low cost 65 nm CMOS platform for low power and general purposes applications, in VLSI Symp. Tech. Dig., 2004, pp. 10-11.
    • F. Arnaud, B. Duriez, B. Tavel, L. Pain, J. Todeschini, M. Jurdit, Y. Laplanche, F. Boeuf, F. Salvetti, D. Lenoble, J. P. Reynard, F. Wacquant, P. Morin, N. Emonet, D. Barge, M. Bidaud, D. Ceccarelli, P. Vannier, Y. Loquet, H. Leninger, F. Judong, C. Perrot, I. Guilmeau, R. Palla, A. Beverina, V. DeJonghe, M. Brockaart, V. Vachellerie, R. A. Blanchi, B. Borot, T. Devoivre, N. Bicaïs, D. Roy, M. Denais, K. Rochereau, R. Difrenza, N. Planes, H. Brut, L. Vishnobulta, D. Reber, P. Stolk, and M. Woo, "Low cost 65 nm CMOS platform for low power and general purposes applications," in VLSI Symp. Tech. Dig., 2004, pp. 10-11.


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