Matching analysis of deposition defined 50-nm mosfet's

IEEE Transactions on Electron Devices

Volumn 45, Issue 1, 1998, Pages 299-306

  Horstmann, John T ^a   Hilleringmann, Ulrich ^a   Goser, Karl F ^a  

^a TU DORTMUND UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEPOSITION; GATES (TRANSISTOR); LITHOGRAPHY; MASKS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DOPING;

OPTICAL LITHOGRAPHY;

MOSFET DEVICES;

EID: 0031646544     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.658845     Document Type: Article

References (16)

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