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Volumn 19, Issue 4, 2006, Pages 507-514

Evaluation of resist capability for EUV lithography

Author keywords

Cholate derivatives; EUV lithography; Molecular resists; Polyphenol

Indexed keywords


EID: 33748449444     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.507     Document Type: Article
Times cited : (9)

References (42)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.