Novel illumination system for EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 765-776

  Komatsuda, Hideki ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; MIRRORS; PROJECTION SYSTEMS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); ILLUMINATION PROJECTION SYSTEMS; KOELER ILLUMINATION;

PHOTOLITHOGRAPHY;

EID: 0033698635     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)