Stress field in sputtered thin films: Ion irradiation as a tool to induce relaxation and investigate the origin of growth stress

Applied Physics Letters

Volumn 84, Issue 24, 2004, Pages 5034-5036

  Debelle, A ^a   Abadias, G ^a   Michel, A ^a   Jaouen, C ^a  

^a UMR 6630   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIBILITY; DEPOSITION; ELASTICITY; FILM GROWTH; ION BOMBARDMENT; LATTICE CONSTANTS; MOLYBDENUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; STRESS RELAXATION; X RAY DIFFRACTION ANALYSIS;

ELASTIC STRAINS; HYDROSTATIC STRESSES; STRESS FIELDS; STRESS-FREE LATTICE PARAMETERS;

THIN FILMS;

EID: 3042735570     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1763637     Document Type: Article

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