Substrate bias dependence of the structure and internal stress of TiN films deposited by the filtered cathodic vacuum arc

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 4, 2002, Pages 1327-1331

  Cheng, Y H ^a   Tay, B K ^b   Lau, S P ^b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; COMPOSITION EFFECTS; CRYSTAL STRUCTURE; DEPOSITION; FILMS; MORPHOLOGY; RESIDUAL STRESSES; SUBSTRATES; SURFACE ROUGHNESS; SURFACES; X RAY DIFFRACTION ANALYSIS;

ATOMIC PEENING; FILMS DEPOSITION; FILTERED CATHODIC VACUUM ARC; SUBSTRATE BIAS DEPENDENCE;

TITANIUM NITRIDE;

EID: 0036649743     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1482708     Document Type: Article

References (31)