Development of texture in TiN films deposited by filtered cathodic vacuum arc

Journal of Crystal Growth

Volumn 252, Issue 1-3, 2003, Pages 257-264

  Cheng, Y H ^a,c   Tay, B K ^b  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

A1. Texture; A1. X ray diffraction; A3. Filtered cathodic vacuum arc; B1. TiN films

Indexed keywords

DEPOSITION; SURFACE ROUGHNESS; TEXTURES; TITANIUM NITRIDE; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

FILTERED CATHODIC VACUUM ARC;

THIN FILMS;

EID: 0037401843     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(03)00871-6     Document Type: Article

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