On the origin of stress in magnetron sputtered TiN layers

Journal of Applied Physics

Volumn 88, Issue 11, 2000, Pages 6332-6345

  Kamminga, J D ^a   De Keijser, Th H ^a   Delhez, R ^a   Mittemeijer, E J ^a,b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010034760     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1319973     Document Type: Article

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