Ultra-high accuracy optical testing: Creating diffraction-limited short-wavelength optical systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5900, Issue , 2005, Pages 1-10

  Goldberg, Kenneth A ^a   Naulleau, Patrick P ^a   Rekawa, Senajith B ^a   Denham, Paul E ^a   Alexander Liddle, J ^a   Gullikson, Eric M ^a   Jackson, Keith H ^a   Anderson, Erik H ^a   Taylor, John S ^b   Sommargren, Gary E ^b   Chapman, Henry N ^b   Phillion, Donald W ^b   Johnson, Michael ^b   Barty, Anton ^b   Soufli, Regina ^b   Spiller, Eberhard A ^b   Walton, Christopher C ^b   Bajt, Saša ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Diffraction limited; EUV; Extrerpe ultraviolet; Interferometry; Optics

Indexed keywords

DIFFRACTION-LIMITED; OPTICAL IMAGING SYSTEMS; PROJECTION LENSES;

FABRICATION; IMAGING SYSTEMS; INTERFEROMETRY; LENSES; LIGHT SOURCES; OPTICAL TESTING; PHOTOLITHOGRAPHY; SPACE TELESCOPES; X RAY OPTICS;

OPTICAL SYSTEMS;

EID: 29844443031     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.618066     Document Type: Conference Paper

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