XCEED: XTREME commercial EUV exposure diagnostic experiment

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1192-1202

  Antonsen, Erik L ^a   Thompson, Keith C ^a   Hendricks, Matthew R ^a   Alman, Darren A ^a   Jurczyk, Brian E ^a   Ruzic, David N ^a   Chinh, Tran Duc ^b   Edwards, Ginger ^c   Wurm, Stefan ^c   Wood, Obert ^c   Bristol, Robert ^d  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b XTREME Technologies GmbH   (Germany)

^c SEMATECH   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

Debris Characterization; Debris Mitigation; DPP; ESA; EUV; EUV Light Source; Extreme Ultraviolet; ITOF; Spherical Sector Energy Analyzer; XTS 13 35

Indexed keywords

DEBRIS CHARACTERIZATION; DEBRIS MITIGATION; DPP; ESA; EUV; EUV LIGHT SOURCE; EXTREME ULTRAVIOLET; ITOF; SPHERICAL SECTOR ENERGY ANALYZER; XTS 13-35;

DEBRIS; EROSION; IONS; MEASUREMENTS; MIRRORS; PHOTODIODES; ULTRAVIOLET RADIATION; XENON;

PLASMA DIAGNOSTICS;

EID: 24644482633     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599799     Document Type: Conference Paper

References (12)

1. U. Stamm, J. Kleinschmidt, K. Gabel, H. Birner, I. Ahmad, D. Bolshukin, J. Bruderman, T. D. Chinh, F. Flohrer, S. Gotze, G. Hergenhan, D. Klopfel, V. Korobotchko, B. Mader, R. Muller, J. Ringling, G Schriever, C. Ziener, "EUV Source power and lifetime: the most critical issues for EUV lithography", Proceedings of SPIE: Emerging Lithographic Technologies VIII, SPIE Paper No. 5374-112, Santa Clara, CA, February 2004
2. M. Richardson, C-S.Koay, K. Takenoshita, C. Keyser, S. George, S. Teerawattansook, M. Al-Rabban, H. Scott, "Laser plasma EUVL sources - progress and challenges," Proceedings of SPIE: Emerging Lithographic Technologies VIII, SPIE Paper No. 5374-112, Santa Clara, CA, February 2004
3. Xtreme Technologies GmbH, www.xtremetec.de, Gottingen, Germany.
4. C. P. Browne, D. S. Craig, R. M. Williamson, "Spherical Electrostatic Analyzer for Measurement of Nuclear Reaction Energies," Rev. Sci. Instrum., 22, 12 (1951).
5. J. A. Simpson, "Design of Retarding Field Energy Analyzers," Rev. Sci. Instrum., 32, 12 (1961).
6. F. R. Paolini, G. C. Theodridis, "Charged Particle Transmission Through Spherical Plate Electrostatic Analyzers," Rev. Sci. Instrum., 38, 5 (1967).
7. Comstock Inc., www.comstockinc.com, Oak Ridge, TN.
8. D. Rogers, R. F. Malina, "Optimization of the performance of a tandem microchannel plate detector as a function of interplate spacing and voltage," Rev. Sci. Instrum., 53, 9 (1982).
9. Burle Electro-Optics, www.burle.com, Sturbridge, MA.
10. SPECS Scientific Instruments, Inc., www.specs.com, Sarasota, FL.
11. D. A. Alman, H. Qiu, K. C. Thompson, E. L. Antonsen, J. B. Spencer, M. R. Hendricks, B. E. Jurczyk, D. N. Ruzic, T. Spila, G. Edwards, S. Wurm, R. Bristol, "UIUC Collector Erosion and Optical Lifetime Project Results: Time Dependent Exposures," SPIE International Symposium on Microlithography, Paper No. 5751-137, San Jose, CA, March 2005.
12. U.Stamm, I. Ahmad, I. Balogh, H. Birner, D. Bolshukhin, J. Brudermann, S. Enke, F. Flohrer, K. Gabel, S. Gotze, G. Hergenhan, J. Kleinschmidt, D. Klopfel, V. Korobotchko, J. Ringling, G. Schriever, C. D. Tran, C. Zeiner, "High-Power EUV Lithography Sources Based on Gas Discharges and Laser-Produced Plasmas," Proceedings of SPIE:Emerging Lithographic Technologies VII, SPIE Paper No. 5037-16, Santa Clara, CA, 2003.