Extreme ultraviolet alignment and testing of a four-mirror ring field extreme ultraviolet optical system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2911-2915

  Goldberg, Kenneth A ^a   Naulleau, Patrick ^a   Batson, Phillip ^a   Denham, Paul ^a   Anderson, Erik H ^a   Chapman, Henry ^b   Bokor, Jeffrey ^a,c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGE QUALITY; INTERFEROMETERS; INTERFEROMETRY; LITHOGRAPHY; MIRRORS; PHASE SHIFT; ULTRAVIOLET RADIATION; WAVEFRONTS;

DIFFRACTION INTERFEROMETERS; EXTREME ULTRAVIOLET INTERFEROMETRY (EUV);

OPTICAL SYSTEMS;

EID: 0034317823     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319703     Document Type: Article

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