Honing the accuracy of extreme ultraviolet optical system testing: At-wavelength and visible-light measurements of the ETS Set-2 projection optic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 329-337

  Goldberg, Kenneth A ^a   Naulleau, Patrick ^a   Bokor, Jeffrey ^a   Chapman, Henry N ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

At wavelength testing; EUV; EUV visible light comparison; Extreme ultraviolet lithography; Interferometry

Indexed keywords

ABERRATIONS; ELECTROMAGNETIC WAVE DIFFRACTION; HONING; INTERFEROMETRY; MIRRORS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION; WAVEFRONTS;

PROJECTION OPTICS;

OPTICAL SYSTEMS;

EID: 0036380126     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472306     Document Type: Conference Paper

References (14)

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10. P.P. Naulleau, P. J. Batson, P. E. Denham, and M. S. Jones, "Miniature self-contained vacuum compatible electronic imaging microscope," U.S. Patent 6,327,102, March, 2000.
11. J. S. Loomis, FRINGE User's Manual, (Optical Sciences Center, U. Arizona, Tuscon, AZ, 1976).
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