EUV interferometric testing and alignment of the 0.3 NA MET optic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 64-73

  Goldberg, Kenneth A ^a   Naulleau, Patrick ^a   Denham, Paul ^a   Rekawa, Senajith B ^a   Jackson, Keith ^a   Liddle, J Alexander ^a   Anderson, Erik H ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

At wavelength testing; EUV; Extreme ultraviolet interferometry; Extreme ultraviolet lithography; MET

Indexed keywords

AT-WAVELENGTH TESTING; EUV; EXTREME ULTRAVIOLET (EUV); EXTREME ULTRAVIOLET INTERFEROMETRY; EXTREME ULTRAVIOLET LITHOGRAPHY; MET; MICRO EXPOSURE TOOLS (MET);

ABERRATIONS; DATA REDUCTION; ERROR ANALYSIS; IMAGING TECHNIQUES; INTERFEROMETRY; MIRRORS; OPTIMIZATION; PHASE SHIFT; ULTRAVIOLET RADIATION; WAVEFRONTS;

LITHOGRAPHY;

EID: 3843137184     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.546199     Document Type: Conference Paper

References (13)

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