A rigorous method for compensation selection and alignment of microlithographic optical systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 102-113

  Chapman, Henry N ^a   Sweeney, Donald W ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Alignment; Assembly; Compensator; EUV projection lithography; SVD; Tolerancing

Indexed keywords

ERROR ANALYSIS; IMAGING SYSTEMS; LINEAR ALGEBRA; PHOTOLITHOGRAPHY;

SINGULAR VALUE DECOMPOSITION (SVD);

OPTICAL SYSTEMS;

EID: 0032402650     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309562     Document Type: Conference Paper

References (18)

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6. Assembly of extreme ultraviolet lithography optics using at-wavelength Foucault testing
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8. Aberration theories for semi-automatic lens design
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10. Zernike circle polynomials and optical aberrations of systems with circular pupils
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