Direct comparison of EUV and visible-light interferometries

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 635-642

  Goldberg, Kenneth A ^a   Naulleau, Patrick ^a   Lee, SangHun ^a   Chang, Chang, ^a   Bresloff, Cynthia ^a   Gaughan, Richard ^a   Chapman, Henry N ^a   Goldsmith, John ^a   Bokor, Jeffrey ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; INTERFEROMETRY; MULTILAYERS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); POINT DIFFRACTION INTERFEROMETERS; SCHWARZSCHILD OBJECTIVES; SURFACE FIGURE MEASUREMENT;

PHOTOLITHOGRAPHY;

EID: 0032653134     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351138     Document Type: Conference Paper

References (25)