Static EUV microexposures using the ETS set-2 optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 36-46

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik H ^a   Bokor, Jeffrey ^a,b   Harteneck, Bruce ^a   Jackson, Keith ^a   Olynick, Deirdre ^a   Salmassi, Farhad ^a   Baker, Sherry ^c   Mirkarimi, Paul ^c   Spiller, Eberhard ^c   Walton, Chris ^c   O'Connell, Donna ^d   Yan, Pei Yang ^e   Zhang, Guojing ^e  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^d SANDIA NATIONAL LABORATORIES   (United States)

^e INTEL CORPORATION   (United States)

Author keywords

Extreme ultraviolet lithography; Microfield printing; Synchrotron radiation

Indexed keywords

LIGHTING; MASKS; MIRRORS; OPTICAL SYSTEMS; OPTICS; PHOTORESISTS; SCREEN PRINTING; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET MICROEXPOSURES; MICROFIELD PRINTING; SYNCHROTRON-BASED PROGRAMMABLE ILLUMINATOR EXPOSURE STATION;

PHOTOLITHOGRAPHY;

EID: 0141794544     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.490129     Document Type: Conference Paper

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