Printing-based performance analysis of the engineering test stand set-2 optic using a synchrotron exposure station with variable sigma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2697-2700

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik H ^a   Bokor, Jeffrey ^a   Harteneck, Bruce ^a   Jackson, Keith ^a   Olynick, Deirdre ^a   Salmassi, Farhad ^a   Baker, Sherry ^b   Mirkarimi, Paul ^b   Spiller, Eberhard ^b   Walton, Chris ^b   O'Connell, Donna ^c   Yan, Pei Yang ^d   Zhang, Guojing ^d  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGE ANALYSIS; INTERFEROMETERS; MASKS; MATHEMATICAL MODELS; SYNCHROTRON RADIATION; SYNCHROTRONS;

EXTREME ULTRAVIOLET (EUV) OPTICS; LITHOGRAPHIC OPTICS;

PHOTOLITHOGRAPHY;

EID: 0942300069     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1621669     Document Type: Conference Paper

References (16)

1. R. Stulen and D. Sweeney, IEEE J. Quantum Electron. 35, 694 (1999).
2. H. Meiling, J. Benschop, R. Hartman, P. Kürz, P. Høghøj, R. Geyl, and N. Harned, Proc. SPIE 4688, 1 (2002).
3. D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, and J. Underwood, Appl. Opt. 32, 7022 (1993).
4. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, Opt. Lett. 21, 1526 (1996).
5. K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, H. Chapman, and J. Bokor, J. Vac. Sci. Technol. B 18, 2911 (2000).
6. J. Goldsmith et al., Proc. SPIE 3676, 264 (1999).
7. K. Hamamoto, T. Watanabe, H. Tsubakino, H. Kinoshita, T. Shoki, and M. Hosoya, J. Photopolym. Sci. Technol. 14, 567 (2001).
8. P. Naulleau et al., J. Vac. Sci. Technol. B 20, 2829 (2002).
9. P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, Appl. Opt. 42, 820 (2003).
10. P. Naulleau et al., Proc. SPIE 4688, 64 (2002).
11. D. W. Sweeney, R. Hudyma, H. N. Chapman, and D. Shafer, Proc. SPIE 3331, 2 (1998).
12. K. Goldberg, P. Naulleau, J. Bokor, and H. Chapman, Proc. SPIE 4688, 329 (2002).
13. D. O'Connell et al., Proc. SPIE (to be published).
14. S. Lee, D. Tichenor, and P. Naulleau, J. Vac. Sci. Technol. B 20, 2849 (2002).
15. S. Lee et al., Proc. SPIE 4688, 266 (2002).
16. P. Naulleau et al., Proc. SPIE (to be published).