EUV microexposures at the ALS using the 0.3-NA MET projection optics

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 56-63

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik ^a   Cain, Jason P ^b   Denham, Paul ^a   Hoef, Brian ^a   Jackson, Keith ^a   Morlens, Anne Sophie ^a   Rekawa, Seno ^a   Dean, Kim ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c SEMATECH   (United States)

Author keywords

Coherence; Extreme ultraviolet lithography; Synchrotron; Variable sigma illuminator

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; LINE-EDGE ROUGHNESS (LER); MICRO EXPOSURE TOOLS (MET) OPTIC; VARIABLE-SIGMA ILLUMINATOR;

ABERRATIONS; COHERENT LIGHT; LIGHT SOURCES; MASKS; MONITORING; OPTICAL RESOLVING POWER; PHOTORESISTS; SYNCHROTRONS;

ULTRAVIOLET RADIATION;

EID: 24644450119     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600388     Document Type: Conference Paper

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