Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 51-59

  Soufli, R ^a   Spiller, E ^a   Schmidt, M A ^a   Courtney Davidson, J ^a   Grabner, R F ^a   Gullikson, E M ^a   Kaufmann, B B ^a   Mrowka, S ^a   Baker, S L ^a   Chapman, H N ^a   Hudyma, R M ^a   Taylor, J S ^a   Walton, C C ^a   Montcalm, C ^a   Folta, J A ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Extreme ultraviolet (EUV) lithography; Multilayer optics; Reflectivity; Thickness uniformity

Indexed keywords

ABERRATIONS; CAMERAS; MAGNETRON SPUTTERING; MIRRORS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; REFLECTIVE COATINGS; SCANNING; SUBSTRATES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

OPTICAL MULTILAYERS;

EID: 17944375589     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436695     Document Type: Conference Paper

References (10)

1. Extreme ultraviolet lithography
2. Extreme ultraviolet lithography
3. EUV engineering test stand
4. Multilayer coated optics for an alpha-class extreme ultraviolet lithography system
5. EUV optical design for a 100 nm CD imaging system
6. High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50-1300 eV energy region
7. Non-specular X-ray reflection from rough multilayers
8. Stochastic model for thin film growth and erosion