Comparisons between EUV at-wavelength metrological methods

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5921, Issue , 2005, Pages 1-8

  Sugisaki, Katsumi ^a   Okada, Masashi ^a   Zhu, Yucong ^a   Otaki, Katsura ^a   Liu, Zhiqiang ^a   Kawakami, Jun ^a   Ishii, Mikihiko ^a   Saito, Jun ^a   Murakami, Katsuhiko ^a   Hasegawa, Masanobu ^b   Ouchi, Chidane ^b   Kato, Seima ^b   Hasegawa, Takayuki ^b   Suzuki, Akiyoshi ^b   Yokota, Hideo ^b   Niibe, Masahito ^c   Takeda, Mitsuo ^d  

^a EUVA Sagamihara R and D Center   (Japan)

^b EUVA Utsunomiya R and D Center   (Japan)

^c UNIVERSITY OF HYOGO   (Japan)

^d UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

EUV lithography; Interferometry; Lateral shearing interferometer; Optical testing; Point diffraction interferometer

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; INTERFEROMETRY; LITHOGRAPHY; OPTICAL TESTING;

EUV LITHOGRAPHY; LATERAL SHEARING INTERFEROMETER; POINT DIFFRACTION INTERFEROMETER;

OPTICAL VARIABLES MEASUREMENT;

EID: 31844448934     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.616676     Document Type: Conference Paper

References (14)

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