Nanofabrication and diffractive optics for high-resolution X-ray applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2970-2975

  Anderson, Erik H ^a   Olynick, Deirdre L ^a   Harteneck, Bruce ^a   Veklerov, Eugene ^a   Denbeaux, Gregory ^a   Chao, Weilun ^a   Lucero, Angelic ^a   Johnson, Lewis ^a   Attwood, David ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; MONOCHROMATORS; NANOTECHNOLOGY; NICKEL; POLYMETHYL METHACRYLATES; X RAY MICROSCOPES;

FRESNEL ZONE PLATE LENSES;

DIFFRACTIVE OPTICS;

EID: 0034314709     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321282     Document Type: Article

References (19)

1. D. Tichenor et al., Proc. SPIE 3997, 48 (2000).
2. P. Kirkpatrick and A. V. Baez, J. Opt. Soc. Am. 38, 766 (1948).
3. C. Jacobsen, S. Williams, E. Anderson, M. T. Browne, C. J. Buckley, D. Kern, J. Kirz, M. Rivers, and X. Zhang, Opt. Commun. 86, 351 (1992).
4. H. Ade, Ph.D. thesis, Physics Department, SUNY, Stony Brook, 1990.
5. C. Jacobsen, S. Lindaas, S. Williams, and X. Zhang, J. Microsc. 172, 121 (1993).
6. W. Meyer-Ilse, T. Warwick, and D. Attwood, X-Ray Microscopy (AIP, New York, 1999), p. 129.
7. B. H. Koek, T. Chisholm, A. J. V. Run, J. Romijn, and J. P. Davey, Microelectron. Eng. 23, 81 (1994).
8. E. H. Anderson, V. Boegli, and L. P. Muray, J. Vac. Sci. Technol. B 13, 2529 (1995).
9. W. H. Press, B. P. Flannery, S. A. Teukolsky, and W. T. Vetterling, Numerical Recipes (Cambridge University Press, Cambridge, UK, 1986), p. 52.
10. J. Fujita, Y. Ohnishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett. 68, 1297 (1996).
11. S. Spector, C. Jacobsen, and D. Tennant, J. Vac. Sci. Technol. B 15, 2872 (1997).
12. Microlithography Chemical Company, 294 Pleasant St., Watertown, MA 02172.
13. K. Y. Lee and W. S. Huang, J. Vac. Sci. Technol. B 11, 2807 (1993).
14. Z. Cui, A. Gerardino, M. Gentili, E. DiFabrizio, and P. D. Prewett, J. Vac. Sci. Technol. B 16, 3284 (1998).
15. E. A. Dobisz and C. R. K. Marrian, J. Vac. Sci. Technol. B 15, 2327 (1997).
16. Sulfamex make up solution, Enthone Omi, 350 Frontage Rd., West Haven, CT 06516.
17. TCI America, 9211 North Harborgate St., Portland, OR 97203.
18. BDT510 make up solution, Enthone Omi, 350 Frontage Rd., West Haven, CT 06516.
19. K. A. Goldberg, P. Naulleau, P. Batson, P. Denham, E. H. Anderson, H. Chapman, and J. Bokor, J. Vac. Sci. Technol. B, these proceedings.