Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 264-270

  Goldberg, Kenneth A ^a,b   Tejnil, Edita ^a,b   Lee, Sang Hun ^a,b   Medecki, Hector ^a   Attwood, David T ^a,b   Jackson, Keith H ^a   Bokor, Jeffrey ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Extreme ultraviolet lithography; Interferometry; Phase shifting interferometry; Point diffraction interferometry

Indexed keywords

DIFFRACTION; EXTREME ULTRAVIOLET LITHOGRAPHY; GRAVITATION; OPTICAL MULTILAYERS; OPTICAL SYSTEMS; WAVEFRONTS;

EXTREME ULTRAVIOLET PROJECTION LITHOGRAPHY; INTERFEROMETRIC MEASUREMENT; PHASE SHIFTING INTERFEROMETRY; PHASE SHIFTING POINT DIFFRACTION INTERFEROMETERS; POINT DIFFRACTION INTERFEROMETRY; REFLECTIVE OPTICAL SYSTEM; SCHWARZSCHILD OBJECTIVE; SUBNANOMETER RESOLUTION;

INTERFEROMETRY;

EID: 0001582350     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275787     Document Type: Conference Paper

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