Extreme-ultraviolet phase-shifting point-diffraction interferometer: A wave-front metrology tool with subangstrom reference-wave accuracy

Applied Optics

Volumn 38, Issue 35, 1999, Pages 7252-7263

  Naulleau, Patrick P ^a   Goldberg, Kenneth A ^a   Lee, Sang H ^a,b   Chang, Chang ^a,b   Attwood, David ^a,b   Bokor, Jeffrey ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000805935     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.38.007252     Document Type: Article

References (16)

1. J. H. Underwood and T. W. Barbee, Jr., “Layered synthetic microstructures as Bragg diffractors for X rays and extreme ultraviolet: theory and predicted performance,” Appl. Opt. 20, 3027-3034 (1981).
2. D. M. Williamson, “The elusive diffraction limit,” in Extreme Ultraviolet Lithography, F. Zernike and D. T Attwood, eds., Vol. 23 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1995), pp. 68-76.
3. H. Medecki, E. Tejnil, K. A. Goldberg, and J. Bokor, “Phase-shifting point diffraction interferometer,” Opt. Lett. 21, 1526-1528 (1996).
4. E. Tejnil, K. A. Goldberg, S. H. Lee, H. Medecki, P. J. Batson, P. E. Denham, A. A. MacDowell, J. Bokor, and D. Attwood, “At-wavelength interferometry for EUV lithography,” J. Vac. Sci. Technol. B 15, 2455-2461 (1997).
5. K. A. Goldberg, E. Tejnil, S. H. Lee, H. Medecki, D. T. Attwood, K. H. Jackson, and J. Bokor, “Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry,” in Emerging Lithographic Technologies, D. E. Seeger, ed., Proc. SPIE 3048, 264-270 (1997).
6. K. A. Goldberg, “Extreme ultraviolet interferometry,” Ph.D. dissertation (University of California, Berkeley, Berkeley, Calif., 1997).
7. J. E. Bjorkholm, A. A. MacDowell, O. R. Wood II, Z. Tan, B. LaFontaine, and D. M. Tennant, “Phase-measuring interferometry using extreme ultraviolet radiation,” J. Vac. Sci. Technol. B 13, 2919-2922 (1995).
8. A. K. Ray-Chaudhuri, W. Ng, F. Cerrina, Z. Tan, J. Bjorkholm, D. Tennant, and S. J. Spector, “Alignment of a multilayer-coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing,” J. Vac. Sci. Technol. B 13, 3089-3093 (1995).
9. W. Linnik, “A simple interferometer to test optical systems,” Proc. P. N. Lebedev Phys. Inst. 1, 210-212 (1933).
10. R. N. Smartt and W. H. Steel, “Theory and application of point-diffraction interferometers,” Jpn. J. Appl. Phys. 14, Suppl. 14-1, 351-356 (1975).
11. A. Bathia and E. Wolf, “The Zernike circle polynomials occurring in diffraction theory,” Proc. Phys. Soc. London Sect. B 65, 909-910 (1952).
12. D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, R. P. Nissen, R. L. Schmitt, G. A. Wilkerson, L. A. Brown, P. A. Spence, P. S. Jin, W. C. Sweat, W. W. Chow, J. E. Bjorkholm, R. R. Freeman, M. D. Himel, A. A. MacDowell, D. M. Tennant, O. R. Wood II, W. K. Waskiewicz, D. L. White, D. L. Windt, and T. E. Jewell, “Development and characterization of a 10 X Schwarzschild system for SXPL,” in Soft-X-Ray Projection Lithography, A. M. Hawryluk and R. H. Stulen, eds., Vol. 18 of OSA Proceedings Series (Optical Society of America, Washington, D.C., 1993), pp. 79-82.
13. K. A. Goldberg, P. Naulleau, S. Lee, C. Chang, C. Bresloff, R. Gaughan, H. Chapman, J. Goldsmith, and J. Bokor, “Direct comparison of EUV and visible-light interferometries,” in Emerging Lithographic Technologies III, Y. Vladimirsky, ed., Proc. SPIE 3676, 635-642 (1999).
14. M. Takeda, H. Ina, and S. Kobayashi, “Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry,” J. Opt. Soc. Am. 72, 156-160 (1982).
15. R. Beguiristain, J. Underwood, M. Koike, P. Batson, E. Gul-likson, K. Jackson, H. Medecki, and D. Attwood, “High flux undulator beam line optics for EUV interferometry and photoemission microscopy,” in High Heat Flux Engineering III, A. M. Khounsary, ed., Proc. SPIE 2855, 159-169 (1996).
16. D. Attwood, G. Sommargren, R. Beguiristain, K. Nguyen, J. Bokor, N. Ceglio, K. Jackson, M. Koike, and J. Underwood, “Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography,” Appl. Opt. 32, 7022-7031 (1993).