Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2939-2943

  Naulleau, Patrick P ^a   Goldberg, Kenneth A ^a   Bokor, Jeffrey ^a,b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HETERODYNING; INTERFEROMETRY; LITHOGRAPHY; ULTRAVIOLET RADIATION;

SHEARING INTERFEROMETRY; X RAY OPTICS;

OPTICAL SYSTEMS;

EID: 0034314736     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321290     Document Type: Article

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